An overview of microneedle applications, materials, and fabrication methods

• Zahra Faraji Rad,
• Philip D. Prewett and
• Graham J. Davies

Beilstein J. Nanotechnol. 2021, 12, 1034–1046, doi:10.3762/bjnano.12.77

• dissolving versions for drug delivery [27][37][99]. Figure 4a is a schematic of the manufacturing procedure for γ-PGA microneedles and Figure 4b shows the manufactured array [99]. In another study, photolithography was first used to create master structures from SU-8 photoresist by UV photolithography

• etching using an inductively coupled plasma (ICP) etcher, then the polymer microneedles were replicated using a PDMS negative soft mould and hot embossing [100]. SU-8 photoresist has been used, not just for master moulds, but also as the final material for microneedles. Long hollow microneedles, ≈1500 μm

Intracranial recording in patients with aphasia using nanomaterial-based flexible electronics: promises and challenges

• Qingchun Wang and
• Wai Ting Siok

Beilstein J. Nanotechnol. 2021, 12, 330–342, doi:10.3762/bjnano.12.27

• (iWEBS) was fabricated to map cortical connectivity in a wide region, as presented in Figure 5a. The microelectrode array was made of patterned Au wires passivated with SU-8 photoresist on a flexible polyimide (PI) substrate (Figure 5b). The thickness of iWEBSis was only 14.5 µm with 2 µm SU-8 and 12.5

Atomic force acoustic microscopy reveals the influence of substrate stiffness and topography on cell behavior

• Yan Liu,
• Li Li,
• Xing Chen,
• Ying Wang,
• Meng-Nan Liu,
• Jin Yan,
• Liang Cao,
• Lu Wang and
• Zuo-Bin Wang

Beilstein J. Nanotechnol. 2019, 10, 2329–2337, doi:10.3762/bjnano.10.223

• able to characterize materials at high lateral resolution. To produce substrates of tunable stiffness and topography, we imprint nanostripe patterns on undeveloped and developed SU-8 photoresist films using electron-beam lithography (EBL). Elastic deformations of the substrate surfaces and the cells

• for the tissue regeneration therapy in biomedicine. Keywords: atomic force acoustic microscopy (AFAM); cell growth; nanopattern; stiffness; SU-8 photoresist; topography; Introduction The interactions of cells with extracellular matrices (ECMs) play important roles in regenerative medicine and tissue

• SU-8 photoresist films as the substrate and generated local changes in the stiffness and the nanopattern topography on the surface. The SU-8 photoresist has been used as the material for biosensors in living tissues [24] and cell culture molds in vitro due to its excellent biocompatibility [16] and

Copper atomic-scale transistors

• Fangqing Xie,
• Maryna N. Kavalenka,
• Moritz Röger,
• Daniel Albrecht,
• Hendrik Hölscher,
• Jürgen Leuthold and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2017, 8, 530–538, doi:10.3762/bjnano.8.57

• thickness of 3 nm/40 nm deposited on a silicon wafer covered with a thermal oxide layer (300 nm) using e-beam evaporation. The gap between the source and the drain is 2 μm, and the distance from the gate to the source is approximately 147 μm. The electrolyte channel developed in an SU-8 photoresist film is

• using direct laser writing and reactive ion etching techniques (Method 2 described in the Experimental section). The window with a diameter of 3 mm and height of 0.05 mm was fabricated in the SU-8 photoresist. In order to observe fabrication and operation of the copper transistor in situ, a ceramic

• the surrounding Cr/Au film, and then the photoresist was stripped. To insulate the microelectrodes, an adhesion promoter (TI-Prime, MicroChemicals GmbH, Ulm, Germany) and SU-8 photoresist (3 µm) were spin-coated and soft baked (TI Prime: 120 °C, 2 min; SU-8: 95 °C, 5 min). The openings in the

When the going gets rough – studying the effect of surface roughness on the adhesive abilities of tree frogs

• Niall Crawford,
• Thomas Endlein,
• Jonathan T. Pham,
• Mathis Riehle and
• W. Jon P. Barnes

Beilstein J. Nanotechnol. 2016, 7, 2116–2131, doi:10.3762/bjnano.7.201

• involves laying down a layer of SU-8 photoresist, then applying a mask to remove specific areas of resistance, and then etching the exposed areas to give the desired patterns. The moulds were negatives of the PDMS patterned surfaces, which produced surfaces consisting of round dimples having fixed